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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/100093


    題名: Evaluation of diffusion barrier between lead-free solder systems and thermoelectric materials
    作者: 吳子嘉;Lin, T.Y.;Liao, C.N.;Wu, Albert T.
    貢獻者: 工學院化學工程與材料工程學系
    關鍵詞: Applied sciences;Characterization and Evaluation of Materials;Chemistry and Materials Science;Cross-disciplinary physics: materials science;rheology;Diffusion;Diffusion barriers;Electricity;Electronics;Electronics and Microelectronics;Exact sciences and technology;Instrumentation;Intermetallic compounds;Intermetallics;Lead;Materials;Materials Science;Methods of crystal growth;physics of crystal growth;Nickel;Optical and Electronic Materials;Physics;Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices;Silver;Soldering;Solders;Solid State Physics;Theory and models of crystal growth;physics of crystal growth, crystal morphology and orientation;Thermodynamics;Thermoelectric materials;Thermoelectric, pyroelectric devices, etc;Tin base alloys
    日期: 2012-01-01
    上傳時間: 2026-04-21 13:48:54 (UTC+8)
    出版者: Springer New York;Boston: Springer US
    摘要: 摘要: The intermetallic compound SnTe rapidly formed at interfaces between p -type bismuth telluride (Bi 0.5 Sb 1.5 Te 3 ) thermoelectric materials and lead-free solders. The intermetallic compound influences the mechanical properties of the joints and the reliability of the thermoelectric modules. Various lead-free solder alloys, Sn-3.5Ag, Sn-3Ag-0.5Cu, Sn-0.7Cu, and Sn-2.5Ag-2Ni, were used to investigate the interfacial reactions. The results thus obtained show that Ag and Cu preferentially diffused into the Te-rich phase in Bi 0.5 Sb 1.5 Te 3 , so layers of Ag-Te and Cu-Te compounds could not form an effective diffusion barrier. Electroless nickel-phosphorus was plated at the interfaces to serve as a diffusion barrier, and the (Cu,Ni) 6 Sn 5 compound formed instead of SnTe. Furthermore, the intermetallic compound NiTe formed between nickel- phosphorus and Bi 0.5 Sb 1.5 Te 3 and also served as a diffusion barrier. A plot of thickness as a function of annealing time yielded the growth kinetics of the intermetallic compounds in the thermoelectric material systems. The activation energy for the growth of the NiTe intermetallic compound is 111 kJ/mol.
    其他題名: Journal of Elec Materi
    出版者: Boston: Springer US
    出版日期: 2012-01
    出處: Journal of electronic materials, 2012-01, Vol.41 (1), p.153-158
    資源來源: OmniFile Full Text Select(H.W. Wilson)-EBSCOhost全文資料庫
    版權: TMS 2011
    版權: 2015 INIST-CNRS
    版權: TMS 2012
    識別號: ISSN: 0361-5235
    識別號: EISSN: 1543-186X
    識別號: DOI: 10.1007/s11664-011-1740-8
    識別號: CODEN: JECMA5
    顯示於類別:[化學工程與材料工程學系 ] 期刊論文

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