隨著綠能技術蓬勃發展，在海水電解產氫系統中，雙極板（Bipolar Plate， BP）作為電解槽的核心組件，然而金屬雙極板（如 SUS316 不鏽鋼）在嚴苛的海水環境中，面臨嚴重的氯離子腐蝕與鈍化膜劣化等挑戰。 本研究以直流磁控濺鍍於 SUS316 不鏽鋼與 p-type Si (100) 基板上沉積 TiAlCrNbVZr 六元高熵非晶薄膜，探討不同濺鍍功率與快速退火條件對薄膜微觀結構、機械性質、導電性及耐腐蝕性的影響。 結果顯示，於 100 W 至 250 W 濺鍍功率範圍內，所製備之薄膜皆維持非晶質結構，且隨濺鍍功率提升，薄膜之緻密性、硬度、彈性模數與導電性均明顯改善，其中 250 W 試片展現最佳綜合性能，其硬度達 7.42 GPa、彈性模數為 119.69 GPa，表面粗糙度僅 1.85 nm。進一步透過 DSC 分析可知，TiAlCrNbVZr 薄膜之玻璃轉換溫度為 653°C、結晶溫度為 752°C，且具有寬廣的過冷液相區（ΔTx = 99°C），顯示具有優異的熱穩定性與非晶形成能力。以 250 W 初鍍膜進行快速退火後，650°C 試片因結構弛豫與自由體積消除而形成最緻密之非晶結構，因而表現出最高硬度（10.21 GPa）、最佳抗塑性變形能力（H3/E2 = 0.040 GPa）以及最優異之耐腐蝕性（icorr = 0.19 μA/cm2，Rin = 1.05 × 105 Ω·cm2）；相較之下，750°C 退火試片則因局部有序化與奈米晶析出而使部分機械與耐蝕性能略為下降，但其電阻率降至最低，約為 290 μΩ·cm。整體而言，本實驗證實 TiAlCrNbVZr 六元高熵非晶薄膜兼具良好之機械性質、導電性與優異耐腐蝕能力，具備作為嚴苛海水環境下金屬雙極板表面保護層之應用潛力。;With the rapid development of green energy technologies， bipolar plates (BPs) play a critical role in seawater electrolysis systems. However， metallic bipolar plates， such as SUS316 stainless steel， face severe challenges in harsh seawater environments， including chloride-induced corrosion and passivation film degradation. In this study， TiAlCrNbVZr six-element high-entropy amorphous thin films were deposited on SUS316 stainless steel and p-type Si (100) substrates by direct-current (DC) magnetron sputtering. The effects of sputtering power and rapid thermal annealing (RTA) on the microstructural evolution， mechanical properties， electrical resistivity， and corrosion resistance of the films were systematically investigated. The results show that all films deposited within the sputtering power range of 100 W to 250 W retained an amorphous structure， and their densification， hardness， elastic modulus， and electrical conductivity improved with increasing sputtering power. The film deposited at 250 W exhibited the best overall performance， with a hardness of 7.42 GPa， an elastic modulus of 119.69 GPa， and a surface roughness of only 1.85 nm. Differential scanning calorimetry revealed a glass transition temperature of 653°C and a crystallization temperature of 752°C， with a wide supercooled liquid region of 99°C， ， which indicates excellent thermal stability and glass-forming ability. After rapid thermal annealing of the 250 W as-deposited film， the 650°C sample formed the densest amorphous structure due to structural relaxation and free-volume annihilation， Consequently， it exhibited the highest hardness (10.21 GPa)， the best resistance to plastic deformation (H3/E2 = 0.040 GPa)， and the best corrosion resistance (icorr = 0.19 μA/cm2， Rin = 1.05 × 105 Ω·cm2). In contrast， the 750°C annealed sample showed slight degradation in some mechanical and corrosion-related properties due to local ordering and nanocrystal precipitation， although it achieved the lowest electrical resistivity， approximately 290 μΩ·cm. Overall， this study demonstrates that TiAlCrNbVZr six-element high-entropy amorphous thin films possess excellent mechanical stability， electrical conductivity， and corrosion resistance， showing strong potential as protective coatings for metallic bipolar plates in harsh seawater environments.
