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    請使用永久網址來引用或連結此文件: https://ir.lib.ncu.edu.tw/handle/987654321/110344


    題名: 脈衝雷射與退火製程應用於質子傳導型固態氧化物燃料電池陰極;脈衝雷射與退火製程應用於質子傳導型固態氧化物燃料電池陰極
    作者: 陳新晨;CHEN, SHIN-CHEN
    貢獻者: 材料科學與工程研究所
    關鍵詞: 燃料電池;質子傳導型固態氧化物燃料電池;脈衝雷射沉積;脈衝 雷射退火;微波退火;Fuel cell;Proton-conducting solid oxide fuel cell;Pulsed laser deposition;Pulsed laser annealing;Microwave annealing
    日期: 2026-07-30
    上傳時間: 2026-10-20 15:32:46 (UTC+8)
    出版者: 國立中央大學
    摘要: 質子傳導型固態氧化物燃料電池(Proton-conducting solid oxide fuel cells,
    P-SOFCs)因具有高能量轉換效率,並可適用於多種燃料操作環境,近年來
    受到廣泛關注。然而,低溫操作會限制陰極端氧還原反應(Oxygen reduction
    reaction, ORR)動力學,造成極化阻抗增加並降低電池性能。因此,提升陰極
    材料之電化學活性與微結構穩定性,是改善中溫 P-SOFCs 性能的重要關鍵。
    本研究採用脈衝雷射沉積法(Pulsed laser deposition, PLD)製備
    PrBa0.5Sr0.5Co1.5Fe0.5O5+δ(PBSCF)陰極薄膜。PLD 製程可形成由奈米顆粒堆疊之多孔結構,使陰極具有較高孔隙率與較大比表面積,有助於增加氧氣反應
    活性位置並降低陰極極化阻抗。
    此外,本研究比較高溫爐退火(Furnace annealing, FA)、微波退火
    (Microwave annealing, MA)與脈衝雷射退火(Pulsed laser annealing, PLA)三種
    退火方式對PLD PBSCF陰極薄膜之影響。高溫爐退火提供穩定熱處理環境;
    微波退火可快速加熱並抑制過度燒結;脈衝雷射退火則可使薄膜表層快速
    升溫並形成溫度梯度,以調控表面微結構。藉由比較不同退火方式對薄膜微
    結構、結晶性與電化學活性之影響,可評估適合中溫 P-SOFCs 之陰極後處
    理條件。;Proton-conducting solid oxide fuel cells (P-SOFCs) have attracted
    considerable attention due to their high energy conversion efficiency and
    applicability to various fuel environments. However, low-temperature operation
    limits the oxygen reduction reaction (ORR) kinetics at the cathode, leading to
    increased polarization resistance and reduced cell performance. Therefore,
    improving the electrochemical activity and microstructural stability of cathode
    materials is essential for enhancing intermediate-temperature P-SOFC
    performance.
    In this study, PrBa0.5Sr0.5Co1.5Fe0.5O5+δ(PBSCF) cathode films were
    fabricated by pulsed laser deposition (PLD). The PLD process forms a porous
    structure composed of stacked nanoparticles, providing high porosity and a large
    specific surface area, which can increase oxygen reaction active sites and reduce
    cathode polarization resistance.
    Furthermore, the effects of three annealing methods-furnace annealing (FA),
    microwave annealing (MA), and pulsed laser annealing (PLA) on PLD PBSCF
    cathode films were compared. FA provides a stable thermal treatment
    environment, MA enables rapid heating and suppresses excessive sintering, and
    PLA induces rapid surface heating with a temperature gradient for surface
    microstructure control. By comparing the microstructure, crystallinity, and
    electrochemical activity of the films, suitable cathode post-treatment conditions
    for intermediate-temperature P-SOFCs can be evaluated.
    顯示於類別:[材料科學與工程研究所 ] 博碩士論文

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