System for measuring optical admittance of a thin film stack

NCU Institutional Repository > 理學院 > 光電科學研究所 > 期刊論文 > Item 987654321/28161

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/28161

题名:	System for measuring optical admittance of a thin film stack
作者:	Chen,SH;Wu,K;Kuo,CC;Ma,SJ;Lee,CC
贡献者:	光電科學研究所
关键词:	ELLIPSOMETRY;COATINGS
日期:	2009
上传时间:	2010-06-29 19:42:45 (UTC+8)
出版者:	中央大學
摘要:	A new method based on the polarization interferometer structure has been applied to measure the optical admittance, the refractive index and thickness of a thin film. The structure is a vibration insensitive optical system. There is one Twyman-Green interferometer part to induce a phase difference and one Fizeau interferometer part to induce the interference in the system. The intensities coming from four different polarizers were measured at the same time to prevent mechanical vibration influence. Using the polarization interferometer, the optical admittance, the refractive index and thickness of a single layer of Ta2O5 thin film has been measured. The measurement results were compared with the results obtained by ellipsometer. The results meet reasonable values in both refractive index and thickness.
關聯:	OPTICAL REVIEW
显示于类别:	[光電科學研究所] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	747	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing