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    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/29335


    題名: Device linearity comparisons between doped-channel and modulation-doped designs in pseudomorphic Al0.3Ga0.7As/In(0.2)Gao(0.8)As heterostructures
    作者: Yang,MT;Chan,YJ
    貢獻者: 電機工程研究所
    關鍵詞: FET;INSULATOR;MODFET;BAND
    日期: 1996
    上傳時間: 2010-06-29 20:22:05 (UTC+8)
    出版者: 中央大學
    摘要: The linearities of pseudomorphic Al0.3Ga0.7As/ In0.2Ga0.8As doped-channel FET's were characterized by comparing the characteristics of modulation-doped field-effect transistors (FET's) based on de and microwave evaluations. By using an undoped high-bandgap layer beneath the gate, the so-called parasitic MESFET-type conduction, which is common in HEMT's, can therefore be eliminated in doped-channel designs, Therefore, a wide and flat device performance together with a high current driving capability can be achieved in DCFET's. This linearity improvement in device performance suggests that doped-channel designs are more suitable for application in microwave power devices.
    關聯: IEEE TRANSACTIONS ON ELECTRON DEVICES
    顯示於類別:[電機工程研究所] 期刊論文

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