超音波聚焦噴墨技術為近幾年研究發展的一種新穎之噴墨機制。不同於熱氣泡式以及壓電式噴墨法，超音波聚焦噴墨法不需噴嘴及加熱即可達到噴墨之效果。本研究旨在製造並且分析超音波聚焦噴墨裝置中之兩個主要元件：菲涅爾透鏡與氧化鋅換能器。研究中我們使用微機電製程之技術製作操作頻率為100 MHz與200 MHz之菲涅爾聚焦透鏡。透過表面輪廓分析儀與掃描式電子顯微鏡之量測，可觀測出所製作之菲涅爾聚焦透鏡具有三階與四階之結構。在換能器方面，我們使用射頻磁控式濺鍍法來沉積氧化鋅薄膜，並製作結構為 Al/ZnO/Pt/Ti/SiO2/Si 之壓電換能器。將所製作之氧化鋅換能器進行X光繞射儀量測以觀察氧化鋅薄膜之晶體結構。並藉由觀測X光繞射圖中之c軸方向以獲得濺鍍時合適之基板溫度。最後，使用安捷倫公司所生產型號為4395A之阻抗分析儀量測厚度分別為15.31、20.9與24.9 μm氧化鋅薄膜之阻抗值，並証實其共振頻率分別為186.5、131.5與112.2 MHz。 Ultrasonic focusing printing technology is a novel droplet ejection mechanism which has been developed in recent years. Different to the thermal-bubble and piezoelectric printing methods, the ultrasonic focusing printing method ejects droplets required neither nozzle nor heat. The study investigates the fabrication of ultrasonic focusing printing device, especially two main components including Fresnel lens and ZnO transducer. The binary Fresnel lenses with operating frequency at 100 MHz and 200 MHz are fabricated by MEMS technology. The three-level and four-level structural Fresnel lens can be observed by using α-step and SEM. In the aspect of transducer, the ZnO thin films are deposited by RF magnetron sputtering to construct an Al/ZnO/Pt/Ti/SiO2/Si structure piezoelectric transducer. XRD measurement is performed to characterize the crystal structure of ZnO thin films and find suitable substrate temperature for getting well c-axis orientation. The impedance of 15.31, 20.9, and 24.9 μm ZnO transducers are measured by using Agilent 4395A impedance analyzer. It is confirmed that their resonant frequencies of 186.5, 131.5, and 112.2 MHz, respectively.
