Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35240

Title:	Analysis of a two-dimensional photonic bandgap structure fabricated by an interferometric lithographic system
Authors:	Chien,Cheng-Wei;Lee,Yun-Chih;Lee,Po-Shen;Chang,Jenq-Yang;Chen,Jyh-Chen
Contributors:	光電科學與工程學系
Keywords:	INTERFERENCE LITHOGRAPHY;CRYSTALS;GAP;PHOTORESIST;WAVELENGTHS;SCATTERERS;SYMMETRIES;EXPOSURES;GRATINGS;DEFECTS
Date:	2007
Issue Date:	2010-07-07 14:07:36 (UTC+8)
Publisher:	中央大學
Abstract:	An interferometric lithographic technique and double exposure method are applied to theoretically and experimentally investigate several kinds of 2D periodic structures. The shape, lattice symmetries, and lattice constants of the 2D structures, for differ
Relation:	APPLIED OPTICS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

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