A RF magnetron sputter system was used to deposit lithium niobate (LiNbO3) thin films on (111)-oriented Si substrates. An optimal sputtering condition with RF power of 100 W, Ar/O-2 ratio of 1 and substrate temperature of 575 degrees C was investigated. T
關聯:
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
