CO2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35492

Title:	CO2-laser-assisted plasma-enhanced chemical vapor deposition of silicon dioxide thin film
Authors:	Tsai,HS;Chiu,HC;Chang,SH;Cheng,CC;Lee,CT;Liu,HP
Contributors:	光電科學與工程學系
Date:	2001
Issue Date:	2010-07-07 14:30:26 (UTC+8)
Publisher:	中央大學
Abstract:	The plasma enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO2) thin films from SiH4 and N2O has been executed with and without CO2 laser illumination. The quality of the film processed under a 10.6 mum CO2 laser was close to that of a fil
Relation:	JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Appears in Collections:	[Department of Optics and Photonics] journal & Dissertation

Files in This Item:

File	Description	Size	Format
index.html		0Kb	HTML	573	View/Open

社群 sharing