Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

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題名:	Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering
作者:	Lee,CT;Yu,QX;Tang,BT;Lee,HY
貢獻者:	光電科學與工程學系
關鍵詞:	CHEMICAL VAPOR-DEPOSITION;LIGHT-EMITTING DEVICES;THIN-FILMS;ITO FILMS;TRANSPARENT ELECTRODES;SOLAR-CELLS;CRYSTALLIZATION;SPECTROSCOPY;PRESSURE;FAILURE
日期:	2001
上傳時間:	2010-07-07 14:32:26 (UTC+8)
出版者:	中央大學
摘要:	In this study, indium tin oxide (ITO) films were fabricated by r.f. reactive sputtering on glass substrates at room temperature. After the deposition process, the films were treated by oxygen and (30% H-2 + 70% N-2) gas mixture plasma, respectively. The e
關聯:	THIN SOLID FILMS
顯示於類別:	[光電科學與工程學系] 期刊論文

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