中大機構典藏-NCU Institutional Repository-提供博碩士論文、考古題、期刊論文、研究計畫等下載:Item 987654321/49853
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 78937/78937 (100%)
Visitors : 39889994      Online Users : 592
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/49853


    Title: Effects of Film Instability on Roughness Correlation and Nanodomain Ordering in Ultrathin Films of Asymmetric Block Copolymers
    Authors: Sun,YS;Chien,SW;Wu,PJ
    Contributors: 化學工程與材料工程學系
    Keywords: THIN POLYMER-FILMS;X-RAY-SCATTERING;DIBLOCK COPOLYMERS;PATTERN-FORMATION;LIQUID-FILMS;TRANSITION-TEMPERATURE;DISORDER TRANSITION;INDUCED ORIENTATION;ARRAYS;NANOSTRUCTURES
    Date: 2010
    Issue Date: 2012-03-27 16:24:43 (UTC+8)
    Publisher: 國立中央大學
    Abstract: We investigated the dewetting, surface roughness, and ordering of cylindrical nanodomains in polystyrene-block-poly(methyl methacrylate), P(S-h-MM A), ultrathin films of approximately monolayer thickness on bare silicon substrates (SiO(x)/Si) and substrates coated with end-grafting PM MA (PMMA-SiO(x)/ Si) and PS (PS-SiO(x)/Si) homopolymers. For films with asymmetric wetting boundaries on SiO(x)/Si and PMMA-SiO(x)/Si, annealing caused relief structures (holes and islands) locating on top of an underlying P(S-b-M MA) wetting monolayer. The interfaces of the destabilized thin films on polar substrates have a smooth free surface. In addition, a surface undulation in film thickness to achieve the commensurability of film thickness with the nanodomain spacing facilitates the ordering of internal nanostructures. In contrast, for symmetric wetting boundaries on PS-SiO(x)/Si, thin films that resisted dewetting on a PS brush have a rough free surface. In the absence of undulations in thickness, a perturbation, as result of chain stretching, in the interdomain spacing yielded small in-plane randomly oriented monograins on PS-SiO(x)/Si. Consequently, the free surface roughening was allowable to occur due to preferential segregation of excluded polymer chains from monograin boundaries onto the free surface. Finally, we demonstrate that the roughnesses between the interfaces of the wetting monolayer are correlated.
    Relation: MACROMOLECULES
    Appears in Collections:[Department of Chemical and Materials Engineering] journal & Dissertation

    Files in This Item:

    File Description SizeFormat
    index.html0KbHTML376View/Open


    All items in NCUIR are protected by copyright, with all rights reserved.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明