Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc

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题名:	Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc
作者:	Lee,S;Chu,CL;Gwo,J;Huang,JJ;Tsai,MJ;Wang,SM
贡献者:	機械工程學系
关键词:	DIAMOND-LIKE CARBON;DLC FILMS;MECHANICAL-PROPERTIES;ION-IMPLANTATION;DEPOSITION;BEHAVIOR;STEEL
日期:	2011
上传时间:	2012-03-27 17:06:46 (UTC+8)
出版者:	國立中央大學
摘要:	A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C(2)H(2) gas, then deposits on the WC under working conditions of 60 A current and voltage between -50 and -275 V. Such processed diamond-like film containing Ti(Ti-C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.
關聯:	SURFACE ENGINEERING
显示于类别:	[機械工程學系] 期刊論文

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