In Situ Scanning Tunneling Microscopy Study of 3-Mercaptopropanesulfonate Adsorbed on Pt(111) and Electrodeposition of Copper in 0.1 M KClO(4)+1 mM HCl (pH 3)

NCU Institutional Repository > 理學院 > 化學學系 > 期刊論文 > Item 987654321/50897

jsp.display-item.identifier=請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/50897

题名:	In Situ Scanning Tunneling Microscopy Study of 3-Mercaptopropanesulfonate Adsorbed on Pt(111) and Electrodeposition of Copper in 0.1 M KClO(4)+1 mM HCl (pH 3)
作者:	Yen,PY;Tu,HL;Wu,HL;Chen,SZ;Vogel,W;Yau,SL
贡献者:	化學學系
关键词:	SULFURIC-ACID-SOLUTIONS;X-RAY-SCATTERING;UNDERPOTENTIAL DEPOSITION;SUPERCONFORMAL ELECTRODEPOSITION;DAMASCENE ELECTRODEPOSITION;ADDITIVE SYSTEM;ADSORPTION;SPS;CHLORIDE;SURFACE
日期:	2011
上传时间:	2012-03-27 18:12:22 (UTC+8)
出版者:	國立中央大學
摘要:	In situ scanning tunneling microscopy (STM) was used to examine the spatial structure of adsorbed 3-mercaptopropanesulfonate (MPS) molecules on a Pt(111) electrode in 0.1 M KClO(4) + 1 mM HCl + 10(-7) M MPS (pH 3). Two ordered MPS structures, Pt(111) (2 x 2) (theta = 0.25) and (root 3 x root 3)R30 degrees (theta = 0.33) structures were observed at -0.25 V (vs Ag/AgCl). The former (latter) was more important at more negative (positive) potentials. These MPS structures became a disordered adlayer at E > 0.1 V. These restructuring events could result from a progressive increase of the surface coverage of MPS with potential. Shifting the potential negatively could restore the ordered structures of (root 3 x root 3)R30 degrees and (2 x 2), but the rather strong Pt-MPS made it difficult for MPS admolecules to desorb from the Pt(111) electrode. By contrast, the MPS adlayer seen in 0.1 M HClO(4) was always disordered, regardless of the potential of Pt(111) electrode. (Tu et al., J. Electrochem. Soc. 2010, 157, D206.) It is reasonable to state that potential control, pH, and/or countercations to the sulfonate group of the MPS admolecule could be important in guiding the adsorption of MPS molecules on Pt(111) electrode. Strongly adsorbed MPS molecules on the Pt(111) electrode could impede the rate of Cu(2+) reduction, thereby inhibiting rather than accelerating electrodeposition of copper under the present conditions. Real-time STM imaging revealed random nucleation of copper adatoms on Pt(111), followed by lateral growth of Cu nuclei upon further deposition. Segregated domains of (root 3 x root 3)R30 degrees, ascribable to MPS and chloride adspecies, were observed atop a monolayer of Cu deposit prior to the commencement of bulk Cu deposition. With a small overpotential (eta < 20 mV), multilayer copper was electroplated on Pt(111) in a layered manner, producing atomically smooth Cu deposit capped by patches of (3 x 3) MPS. By contrast, the Cu deposit on MPS-modified Pt(111) in 0.1 M HClO(4) was decidedly rough, as reported earlier.
關聯:	JOURNAL OF PHYSICAL CHEMISTRY C
显示于类别:	[化學學系] 期刊論文

文件中的档案:

档案	描述	大小	格式	浏览次数
index.html		0Kb	HTML	473	检视/开启

在NCUIR中所有的数据项都受到原著作权保护.

社群 sharing

数据加载中.....