本篇研究主要是使用 BTME (1,2-Bis(trimethoxysilyl)ethane)、TMOS (Tetramethyl orthosilicate) 與 MPTMS ((3-Mercaptopropyl)trimethoxy- silane) 為共同矽源，以 C16TEABr (Cetyltriethylammonium bromide) 作為模板試劑，在酸性條件下直接合成含有硫基和乙烷有機官能基的 cubic(Pm3n) 中孔洞材料。經由粉末 X-ray 繞射圖譜和等溫氮氣吸脫附的數據，顯示出中孔洞材料的組成有均一的孔洞性質。其 MPTMS 和 BTME 可植入中孔結構中的最大量分別可達 20 ? 和 16 ?。且能在反應中加入過氧化氫試劑，將原本結構中的硫基官能基 (–CH2CH2CH2–SH) 同時行進一步的氧化反應，將硫基官能基氧化成磺酸官能基 (–CH2CH2CH2–SO3H)。最後使用粉末 X-ray 繞射、等溫氮氣吸脫附 (BET)、元素分析 (EA)、29Si 和 13C MAS-NMR、掃描電子顯微鏡 (SEM)、熱重分析儀 (TGA) 做鑑定。 The synthesis of a new class of sulfuric acid-functionalized ethane-bridged, mesoporous hybrid organosilicas is reported. Materials were synthesized by co-condensation of ethane-bridged organosilane (MeO)3SiCH2CH2Si(OMe)3 with 3-mercaptopropyltrimethoxysilane (MeO)3SiCH2CH2CH2SH in the presence of cetyltrimethylammonium bromide surfactant. Powder X-ray diffraction patterns and nitrogen sorption analysis reveal the formation of mesoporous material with uniform porosity. The maximum content of incorporated mercaptopropylsilane in the mesoporous framework obtained was 20 percentage. The thiol (–SH) moieties of mercaptopropyl groups that protrude into the pore channels are readily accessible for further oxidation. The surface moieties functionalized with propylsulfonic groups (–CH2CH2CH2–SO3H) were generated by the controlled oxidation of propylthiol surface groups using hydrogen peroxide. Further, the materials were characterized using elemental analysis (EA) , 29Si and 13C MAS-NMR, scanning electron microscopy (SEM) and TGA.
