本研究進行平行光式曝光機之光學部分研究與發展；從概念發展介 紹、光源部分的光學模擬、及各個光學元件的組裝技術探討。本研究之平 行光式曝光機以短弧氙氣燈為光源，經過各式光學元件將均勻化後之平行 光做為微影的光源，先以LightTools 設計，再以設計值為藍本，以國產的 光學元件替代普遍以國外進口的曝光機光學元件，做出一台達到業界規範 均勻度4%的125mmX125mm 平行光式曝光機，且從設計到製造全由國內 之廠商完成。本研究所發展之技術可用於PCB 板，FPD 等製程之應用， 相當值得進一步研究與發展。;In this study, we present a research and development of a collimated exposure machine. The introduction of concept of development, the simulation of the optical system and the assembly of the optical components. The study of collimated exposure machine use xenon short-arc lamp as the light source, through a variety of optics ,the light will be homogenized. LightTools is used as a design program, then use the optics which are made in Taiwan to build an optics system to complete the designation. The result is a 125mmX125mm exposure area with 4% uniformity exposure machine. The simulation and the assembly of the optical system for the exposure machine use for PCB and FDP manufacture process are the major issue of this tractate.
