193nm深紫外光斜向薄膜之研究; The Research of Obliquely Deposited Films at 193nm

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题名:	193nm深紫外光斜向薄膜之研究;The Research of Obliquely Deposited Films at 193nm
作者:	卓文浩;Wen-Hao Cho
贡献者:	光電科學研究所
关键词:	柱狀結構;斜向蒸鍍;深紫外光;DUV;column structure;obliquely deposited
日期:	2006-06-29
上传时间:	2009-09-22 10:31:32 (UTC+8)
出版者:	國立中央大學圖書館
摘要:	本論文對氟化鎂、氟化鑭、氟化釓三種材料做蒸鍍角度從20 度到70 度斜向蒸鍍，量測其柱狀傾斜角、應力以及薄膜對P、S 偏振光垂直入射於波長193nm 的折射率。柱狀傾斜角以掃瞄式電子顯微鏡觀察之，應力以相位移式應力量測干涉儀測量，折射率則以橢偏儀量測，並以Cauchy Law 做擬合。柱狀傾斜角方面發現Tangent rule： tan??E ?tan?的係數E 只有在蒸鍍角度大於50 度才會趨於定值，不同材料其係數E 不同。隨著蒸鍍角鍍的增大會有壓應力的趨勢。然而雙折射的特性並不是單純的隨蒸鍍角度增加而遞增，氟化鎂在蒸鍍角度為70 度時有最大的折射率差異(0.0576)。氟化鑭需在30 度至60 度之間才明顯的折射率差異，其值約在0.03?0.04 之間。而氟化釓在蒸鍍角度從40 度到50 度之間Ns 與Np 的大小會相反過來。應力方面會隨著蒸鍍角度有先上升在減小的現象。 Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and Gadolinium fluoride for deposition angles in the range 20°–70°. Column angles were determined ex situ from scanning electron microscopy photographs of deposition-plane fractures. Stress was measured from Phase-Shifting Interferometer. The birefringence,Δn = Ns – Np, was determined from ellipsometer and fitted by Cauchy despersion law. We show that the experimental column angles correspond the value predicted by the modified form of the tangent-rule equation ??tan?1(E ?tan?) where E is a constant for deposition angle that is larger than 50°. When the deposition angel becomes large, the stress trend toward compressive stress. However, birefringence does not increase progressively with the deposition increases.Birefringence, Δ n = Ns – Np, of Magnesium fluoride is 0.0576 for deposition angle in 70°. Birefringence of Lanthanum fluoride becomes clear for deposition angle in the rang 30°-60°. Δn = 0.037 for deposition angle in 60°. However theΔn of Gadolinium fluoride would be cross during deposition angle in 40° and 50°.When the deposition angle was increased, the stress would increase first and then decrease progressively.
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