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    题名: 氧化鎂薄膜作為電極保護膜之研究;Research of magnesium oxide film as the protective film for electrodes
    作者: 楊仕勤;Shih-Chin Yang
    贡献者: 光電科學研究所
    关键词: 氧化鎂;保護膜;退火處理;離子助鍍;annealing process;IAD;MgO;protective film
    日期: 2008-07-02
    上传时间: 2009-09-22 10:35:23 (UTC+8)
    出版者: 國立中央大學圖書館
    摘要: 本論文是以電子鎗蒸鍍系統來製鍍氧化鎂薄膜,研究製鍍參數對氧化鎂薄膜的影響,其中包括薄膜的光學特性、結晶形態、水氣吸收及微觀結構。 光學特性方面,在較大陽極電壓的離子助鍍下,氧化鎂薄膜有最大的折射率;結晶特性方面,高溫下製鍍出來的氧化鎂薄膜,其結晶性越好,而退火處理更能進一步的增進氧化鎂薄膜的結晶強度;水氣吸收方面,除當離子助鍍時有較緻密的膜質外,在所有製程中均發現了少量的水氣吸收;表面粗糙度在本實驗中,發現當陽極電壓越大時,表面粗糙度越小,另外在高溫退火也有降低表面粗糙度的效果。The study of magnesium oxide optical thin film by using electron beam evaporation system for protective films was investigated in this thesis. The crystalline properties and optical stability including refractive index, surface roughness, were determined from deposition parameter. Besides, annealing process and evaporation with ion assisted deposition also affect the crystalline properties and optical stability. When the anode voltage is higher, the magnesium oxide optical thin film annexed the best refractive index. The higher substrate temperature will improve the crystalline intensity. Annealing process will also boost the crystalline intensity more extended. Because of the moisture absorption, thin films will not acquire good qualities other than using ion assisted. In our investigation, we found that when the anode voltages increased, the thin film surface roughness was decreased. Besides, the annealing process has the same to reduce the surface roughness as well.
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