本計劃以PQ:PMMA photopolymer材料為核心，往三個高度連結的方向發展，分別為材料製成、理論模型、光學應用。首先為藉由先前經驗改進樣品製作穩定性，並以之為基礎開發以PMMA為基礎之photopolymer光學材料，包括Irgacure 784:PMMA，PQ-DMNA:PMMA，PQ-R6G:PMMA；以穩定材料為基礎進行反應擴散速率等模型建立反應擴散速率聯立微分方程式，並以一系列實驗求得所需之參數，建立理論模型預測材料在記錄光柵時之光學行為，藉此製作更高效率之VBG及二階VBG；對材料之理論特性了解後可依照全像理論製成光學元件應用於半導體雷射，作為先進半導體雷射光學元件改善雷射輸出特性，另外由於新發現之特性讓PQ:PMMA曝光後能產生雙折射特性，亦將探索並其機制並嘗試以此材料製作零階波板。 ;The project bases on PQ:PMMA photopolymer to develop into three interconnected major research directions which are 1.material and fabrication, 2. Theory and model, 3. Optical applications. First direction is to improve the stability of the sample based on prior experience. With the improvement of sample stability, different PMMA-based photopolymer material will be developed and explored including Irgacure 784:PMMA, PQ-DMNA:PMMA and PQ-R6G:PMMA. With the stable sample, the reaction-diffusion rate equations can be developed and the relative parameters can be obtained. The grating formation in the sample can then be predicted. Therefore, higher efficiency VBG and 2nd order VBG can be recorded. With the understanding of the theoretical behavior of the sample, advanced diode laser optics can be fabricated to improve the performance of diode laser output based on the theory and simulation. Also, the newly discovered birefringence properties of PQ:PMMA after exposure allows making 0th order waveplates which will also be explored both theoretically and practically.
