| 摘要: | 熱成像系統應用在紅外光區，一般的玻璃或是塑膠鏡片無法使用，必須矽或是鍺等材料當光學元件，而類鑽碳膜的高硬度和低摩擦係數使該薄膜具有極強的耐磨性及抗腐蝕的能力，此外，類鑽碳薄膜對鍺和矽基板具有非常好的附著力，因此常用於軍事設備中使用的熱成像儀鏡頭的保護層，保護鏡頭不受空氣中的灰塵顆粒、海水、高溫濕度變化以及使用下的磨耗，且折射率在2左右，剛好匹配矽或鍺的折射率成為很好的單層膜的抗反射層及保護層。本計畫利用射頻負偏壓以及微波電漿輔助化學氣相沉積法的架構，可以獨立的控制微波電漿功率與射頻負偏壓大小，並參雜六甲基二矽氧烷，使其以電漿聚合反應參雜SiOx在類鑽碳薄膜中降低應力，探討本鍍膜系統的製程參數如微波電漿功率、射頻偏壓功率、氣體流量、參雜六甲基二矽氧烷對類鑽碳薄膜之機械性質與紅外光學性質的影響，透過百格測試、拉曼光譜儀、奈米壓痕機、傅立葉轉換紅外線光譜儀等設備儀器量測，確認附著性在百格測試下5B，硬度達到10Gpa，並通過高溫85 ℃、高濕 85 % 相對溼度的 100 小時環境測試條件確認無脫膜及膜裂等異常，紅外光區(3-5μm)的雙面抗反射最高點達到穿透率90%以上，應力小於1GPa。 ;The thermal imaging system is applied in the infrared light area. The glass or plastic lenses cannot be used as optical components, it is necessary to use materials such as Silicon and Germanium. The diamond-like carbon film have high hardness and low friction coefficient to make the film extremely resistant, grinding and corrosion resistance. In addition, the diamond-like carbon film has very good adhesion to the Silicon and Germanium substrates, so it is often used in the protective layer of the thermal imager lens of military equipment. Diamond-like carbon film can protect the lens from dust in the air, seawater, high temperature, high humidity, and wear under use. The refractive index is about 2, just matching the refractive index of Silicon and Germanium substrates into a good antireflection layer and a protective layer. This project will using the RF negative bias and microwave plasma enhanced chemical vapor deposition. It can independently control the microwave plasma power and RF negative bias, and mix hexamethyldioxane to reduce stress in diamond-like carbon film. The process parameter of the system such as microwave plasma power, RF bias power, gas flow rate, and hexamethyldioxane flux rate will influence the mechanical and infrared optical properties of Diamond-like carbon film. The measure machine is adhesion test, Raman spectrometer, nanoindentation machine, and Fourier transform infrared spectrometer. The adhesion test is 5B, hardness is more than 10Gpa, and no abnormalities such as release film and film crack after 100-hour environmental test conditions of high temperature 85 °C and high humidity 85% relative humidity. The highest transmittance of infrared light region (3-5 μm) of double-sided anti-reflection is more than 90% and the stress is less than 1GPa. |
