本計畫為”CAAC濺鍍磊晶技術與其在軟性薄膜元件之應用”，為CAAC (C-axis Aligned Crystal) C軸磊晶技術，本計畫的研究目標則是藉由本研究團隊自行開發之高能磁控濺鍍來發展CAAC濺鍍磊晶材料，在近幾年來利用此技術之IGZO薄膜電晶體具有高載子遷移率， ;This is a proposal entitled of “CAAC Sputtering Epi Technology for the Application of the Flexible Thin-film Devices” regarding the development of IGZO materials by high power impulse magnetron sputtering developed by the research team.
