English  |  正體中文  |  简体中文  |  全文筆數/總筆數 : 78852/78852 (100%)
造訪人次 : 36605444      線上人數 : 1221
RC Version 7.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
搜尋範圍 查詢小技巧:
  • 您可在西文檢索詞彙前後加上"雙引號",以獲取較精準的檢索結果
  • 若欲以作者姓名搜尋,建議至進階搜尋限定作者欄位,可獲得較完整資料
  • 進階搜尋


    請使用永久網址來引用或連結此文件: http://ir.lib.ncu.edu.tw/handle/987654321/86100


    題名: 超導量子干涉元件製作;Fabrication of Superconducting Quantum Interference Device
    作者: 張瑋晟;JHANG, WEI-CHENG
    貢獻者: 物理學系
    關鍵詞: 超導量子干涉元件;製程
    日期: 2021-07-08
    上傳時間: 2021-12-07 12:02:27 (UTC+8)
    出版者: 國立中央大學
    摘要: 本論文主要研究目的為製作出超導量子干涉元件,並能控制製作出的元件之電阻值。元件有兩種設計,一種用於量測元件室溫電阻值和臨界電流等特性,另一種上面有共面波導結構用於微波量測。
    元件的製作方法為黃光微影製程製作1 μm 以上結構,電子束微影製程製作1 μm以下結構,蒸鍍使用電子槍蒸鍍機台,約瑟夫森接面的製作方式為Dolan bridge 光阻結構、陰影蒸鍍和腔體內氧化。控制電阻的主要方法為利用慕尼黑工業大學物理系WMI 實驗室提出的P^(1/2)t rule;調整氧化壓力Pox 和氧化時間tox 來達到控制電阻的目的。
    本文量測元件的電阻數據來完成P^(1/2)t rule 的擬合,量測元件電壓電流曲線圖(I-V Curve) 來確認元件的超導特性,量測磁通量影響通過超導線圈電流的關係確認元件組成超導線圈且受磁通量影響。
    經過研究後我們可以製作出10 kΩ 以下的超導量子干涉元件,發現我們的元件有嚴重的臨界電流抑制現象,電阻越高的元件此現象越明顯。同時發現我們超導線圈的loop size 和設計圖上的設計有誤差,我們也找到了一些會影響我們實驗室製作超導元件成功率的因素。;The goal of this thesis is to produce superconducting quantum interference device(SQUID) and control the resistance of the device. We have two kinds of designs: one is used to measure resistance and critical current characteristics at room temperature, and the other with a coplanar waveguide structure is used for microwave measurement.
    The production uses the photolithography process to produce the structure above 1 micron, and the electron beam lithography process to produce the structure below 1 micron, and electron gun evaporation process to produce thin aluminum film. The fabrication methods of the Josephson junction are Dolan bridge, shadow evaporation and oxidation in the evaporation cavity. The way of controlling the resistance is to use P^(1/2)t rule which proposed by WMI laboratory of the Physics Department of Technische Universit?t M?nchen; By adjusting the oxidation pressure Pox and oxidation time tox to achieve the purpose of controlling the resistance.
    This thesis measures the resistance data of the SQUID to fit P^(1/2)t rule, measures I-V Curve of SQUID to confirm the superconducting characteristics of the devices, and measuring the effect of magnetic flux on superconducting current confirms that the devices are affected by the magnetic flux and compose the superconducting coil.
    In our study, we can produce SQUID below 10 kΩ. We found that our devices have serious critical current suppression. The higher the resistance is, the more serious the
    phenomenon is. At the same time, we found that we have an error between loop size of SQUID and design. we also found some factors that affect the success rate of our sample
    fabrication.
    顯示於類別:[物理研究所] 博碩士論文

    文件中的檔案:

    檔案 描述 大小格式瀏覽次數
    index.html0KbHTML110檢視/開啟


    在NCUIR中所有的資料項目都受到原著作權保護.

    社群 sharing

    ::: Copyright National Central University. | 國立中央大學圖書館版權所有 | 收藏本站 | 設為首頁 | 最佳瀏覽畫面: 1024*768 | 建站日期:8-24-2009 :::
    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - 隱私權政策聲明