奈米壓印技術製作全介電幾何相位超穎表面;Nanoimprint technology for manufacture all-dielectric geometric phase metasurface

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題名:	奈米壓印技術製作全介電幾何相位超穎表面;Nanoimprint technology for manufacture all-dielectric geometric phase metasurface
作者:	陳家琦;Chen, Chia-CHI
貢獻者:	光電科學與工程學系
關鍵詞:	幾何相位;超穎透鏡;超穎表面;奈米壓印;PB-phase;metalens;metasurface;nanoimprint
日期:	2022-01-26
上傳時間:	2022-07-13 18:52:31 (UTC+8)
出版者:	國立中央大學
摘要:	本論文設計了一個結合非球面透與炫耀光柵的離軸聚焦超穎透鏡，將奈米壓印技術與超穎表面做結合，利用奈米壓印技術的便利性以及大面積製作等優點，成功的利用PDMS轉印矽基板上超穎表面至玻璃基板上的PI結構層，並探討其轉印過程中的損耗，本論文探討了壓印後超穎表面之奈米壓印片其光學性質，得到超穎表面之奈米壓印片的焦距:4.17 cm 、放大率:0.38 、Strehl ratio為0.34以及線偏振光合圓偏振光所對應到的最大繞射效率分別為0.0145% 和 0.0115%，低效率主要歸因於圖案轉移過程中矩形納米結構的圓化和相對較薄的厚度。我們發現我們所製作出來的樣品有著完整的成像能力以及部份的偏振轉換率。;In this paper, an off-axis focusing metalens that combines aspheric transparent and dazzling gratings is designed, and the nanoimprint technology is combined with the metasurface. Taking advantage of the convenience of nanoimprint technology and the advantages of large-area fabrication, the successful The use of PDMS to transfer the metasurface on the silicon substrate to the PI structure layer on the glass substrate, and discuss the loss during the transfer process. This paper discusses the optical properties of the nanoimprinted metasurface after imprinting, The focal length: 4.17 cm, magnification: 0.38, Strehl ratio of 0.34, and the maximum diffraction efficiency corresponding to linearly polarized light and circularly polarized light are 0.0145% and 0.0115%, respectively. The low efficiency is mainly attributed to the rounding and relatively thin thickness of the rectangular nanostructures during pattern transfer. We found that the samples we produced had full imaging capability and partial polarization conversion.
顯示於類別:	[光電科學研究所] 博碩士論文

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