Examination of underpotential deposition of copper on Pt(111) electrodes in hydrochloric acid solutions with in situ scanning tunneling microscopy

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/34729

Title:	Examination of underpotential deposition of copper on Pt(111) electrodes in hydrochloric acid solutions with in situ scanning tunneling microscopy
Authors:	Wu,ZL;Yau,SL
Contributors:	化學研究所
Keywords:	X-RAY-SCATTERING;AU(111) ELECTRODE;SURFACES;IODINE;RH(111);COADSORPTION;ADSORPTION;PLATINUM;CHLORIDE;ANIONS
Date:	2001
Issue Date:	2010-07-07 12:11:17 (UTC+8)
Publisher:	中央大學
Abstract:	In situ scanning tunneling microscopy (STM) has been used to examine underpotential deposition (UPD) of Cu at Pt(111) electrodes in the solutions of 0.01 M HCl and 1 mM Cu(ClO4)(2). Cyclic voltammetry reveals two well-defined features at 0.72 and 0.55 V (
Relation:	LANGMUIR
Appears in Collections:	[Graduate Institute of Chemistry] journal & Dissertation

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