Examination of underpotential deposition of copper on Pt(111) electrodes in hydrochloric acid solutions with in situ scanning tunneling microscopy

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题名:	Examination of underpotential deposition of copper on Pt(111) electrodes in hydrochloric acid solutions with in situ scanning tunneling microscopy
作者:	Wu,ZL;Yau,SL
贡献者:	化學研究所
关键词:	X-RAY-SCATTERING;AU(111) ELECTRODE;SURFACES;IODINE;RH(111);COADSORPTION;ADSORPTION;PLATINUM;CHLORIDE;ANIONS
日期:	2001
上传时间:	2010-07-07 12:11:17 (UTC+8)
出版者:	中央大學
摘要:	In situ scanning tunneling microscopy (STM) has been used to examine underpotential deposition (UPD) of Cu at Pt(111) electrodes in the solutions of 0.01 M HCl and 1 mM Cu(ClO4)(2). Cyclic voltammetry reveals two well-defined features at 0.72 and 0.55 V (
關聯:	LANGMUIR
显示于类别:	[化學研究所] 期刊論文

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